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MicroWriter ML Baby: a low-cost, desktop direct-write photolithography machine for rapid prototyping in R&D laboratories and small clean rooms.

Conventional approaches to photolithography are usually based on exposing through a chromium-glass mask manufactured by specialist vendors.  In R&D environments it is often necessary to change the mask design frequently.  Direct-write lithography tools (also known as digital mask aligners or maskless aligners) overcome this problem by holding the mask in software.  Rather than projecting light through a physical mask, direct-write lithography uses computer-controlled optics to project the exposure pattern directly onto the photoresist.

MicroWriter ML3 Baby, MicroWriter ML3 Baby Plus and MicroWriter ML3 Mesa are compact, high-performance, low-cost direct-write optical lithography machines within the MicroWriter ML family and are designed to offer unprecedented value for money in a small laboratory footprint.  Measuring only 70cm x 60cm at its base, the machine sits on a standard laboratory bench or desk and plugs into a supplied laptop computer.  Its only service requirement is a standard power socket.  A light-excluding enclosure with safety interlock allows it to be used equally well in an open laboratory environment or in a clean room.  Easy to use Windows® based software means most exposures can be set up and launched with just a few mouse clicks.

 

• 149mm x 149mm maximum writing area.
• 155mm x 155mm x 7mm maximum wafer size.
• 1µm resolution across full writing area.
• 405nm long-life semiconductor lightsource (385nm available as option).
• Fast writing speed: up to 20mm2/minute writing speed (1µm resolution), allowing a 50mm x 50mm area to be exposed in approximately 2 hours.
• Autofocus system using yellow light – no minimum wafer size.
• High quality optical microscope camera with Olympus infinite conjugate x10 plan objective lens and yellow light illumination for alignment to lithographic markers on the wafer (±2µm 3σ alignment accuracy). Additional x4 digital zoom can be selected in software.
• Grey scale exposure mode for 3-dimensional patterning (255 grey levels).
• Software API for external interfacing and control.
• 0.2µm minimum addressable grid; 20nm minimum sample stage step size.
• Acceptable file formats: CIF, BMP, TIFF.
• External dimensions: 700mm (w) x 700mm (d) x 700m (h), excluding computer.
• Light-excluding enclosure with safety interlock.
• Designed for desktop use – no optical table required.
• Easy to use, Windows® based control software supplied.
• Supplied with pre-configured 64-bit Windows® 10 PC and monitor for ‘plug and play’ installation.
• All cables supplied.
• Extremely competitively priced for University and industrial R&D budgets.
• Can be upgraded for higher performance.

  • MicroWriter ML3

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