The Poznan University of Technology now has advanced optical lithography capability following the successful installation of a MicroWriter ML2. The new machine contains our latest new features, including a technology called FocusLock which automatically measures any variation in focus and corrects in real time, guaranteeing sharply exposed structures even across curved or irregular surfaces. The machine is also the first to receive our 2014 software release which includes microscope digital zooming and stretch/shear correction, both helping optimize alignment between multiple process steps.
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